Expanding Thermal Plasma Deposition of Al‐Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms

作者：Benjamin L Williams; Mikhail V Ponomarev; Marcel A Verheijen; Harm C M Knoops; Abhinaya Chandramohan; Leo Duval; Mauritius C M van de Sanden; Mariadriana Creatore

来源：Plasma Processes and Polymers, 2016, 13(1): 54-69.

DOI：10.1002/ppap.201500179

• deposition
• diagnostics
• modification
• plasma
• polymers

This work presents a review of expanding thermal plasma – chemical vapour deposition (ETP‐CVD) of Al‐doped ZnOtransparent conducting oxides (TCOs), alongside new results providing insights into the role of the plasma chemistry on film microstructure. Standard growth conditions generate high resistiv...