A Process‐Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)

作者：Loc Baggetto; Cédric Charvillat; Jérme Esvan; Yannick Thébault; Diane Samélor; Hugues Vergnes; Brigitte Caussat; Alain Gleizes; Constantin Vahlas

来源：Chemical Vapor Deposition, 2015, 21(10-11-12): 343-351.

DOI：10.1002/cvde.201507190

• Aluminum tri‐isopropoxide
• Amorphous aluminum oxide and oxycarbide film
• Dimethylaluminum isopropoxide
• Direct liquid injection
• MOCVD

Abstract(#br)We present the direct liquid injection CVD of aluminum oxide and oxycarbide thin films using dimethylaluminum isopropoxide at high process temperature (500–700 °C) with the addition of O2 gas, and at low temperature (150–300 °C) with the addition of H2O vapor. Very...