科研之友
微信
新浪微博
Facebook
分享链接
摘要
The presence of perfluoropropane (C3F8) in the electronics industry will affect the arcing and insulation performance of sulfur hexafluoride (SF6) gas, it is necessary to separate C3F8. However, at present, C3F8 of low concentration can not be removed through cryoscopic separation method, and the research reports about using adsorption separation method for the adsorption of C3F8 are still few. This paper used the commercial 13X molecular sieve for adsorption of low concentration C3F8. As well, it simulated the industrial fisxed bed adsorption experiment and measured the dynamic adsorption performance of C3F8 on 13X molecular sieve. The breakthrough curve of commercial 13X molecular sieve for low concentration of C3F8 (ppm) was studied with the change of inlet flow rate, inlet C3F8 mass concentration and adsorption temperature, and the influence degree of each factor was analyzed. The adsorption equilibrium model and kinetic model were fitted by adsorption transmission curve to analyze the adsorption behavior and mechanism of 13X molecular sieve for low concentration of C3F8. The results show that the influence of these three factors orders as follows: inlet gas mass concentration > temperature > inlet flow rate. The adsorption equilibrium model accords with the Langmuir isothermal adsorption model, and the kinetic adsorption model accords with the pseudo-first-order kinetic model. When the temperature is 30 ℃, the inlet flow rate is 1. 2 L/min, the pressure is 0. 12 MPa, and the mass concentration of C3F8 gas is 459 mg/L (ppm), the dynamic adsorption of C3F8 by 13X molecular sieve can reach 5. 428 mmol/g, which provides data reference for the industrial adsorption process of C3F8 ? 2023 South China University of Technology.
- 单位
