Selective modification of Mo/HZSM-5 by atomic layer deposition and effects on methane dehydroaromatizatioin [原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响]

作者：Chen C.-S.; Zhang B.; Qin Y.^*

来源：Modern Chemical Industry, 2019, 39(12): 191-195.

DOI：10.16606/j.cnki.issn0253-4320.2019.12.040

• Atomic layer deposition
• Methane dehydroaromatization
• SiO2

Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

• 单位
  中国科学院大学; 煤转化国家重点实验室